Clik here to view.
Conductive filaments multiplicity as a variability factor in CBRAM.
Umberto Celano, Ludovic Goux, Attilio Belmonte, Karl Opsomer, Christophe Detavernier, Malgorzata Jurczak, Wilfried Vandervorst: Conductive filaments multiplicity as a variability factor in CBRAM. IRPS...
View ArticleClik here to view.
Enhancement of CBRAM performance by controlled formation of a...
Attilio Belmonte, Ludovic Goux, Jiyong Woo, Umberto Celano, Augusto Redolfi, Sergiu Clima, Gouri Sankar Kar: Enhancement of CBRAM performance by controlled formation of a hourglass-shaped filament....
View ArticleClik here to view.
Investigation of the endurance of FE-HfO2 devices by means of TDDB studies.
Karine Florent, A. Subirats, Simone Lavizzari, Robin Degraeve, Umberto Celano, Ben Kaczer, Luca Di Piazza, Mihaela Popovici, Guido Groeseneken, Jan Van Houdt: Investigation of the endurance of FE-HfO2...
View ArticleClik here to view.
New Insights into the Imprint Effect in FE-HfO2 and its Recovery.
Yusuke Higashi, Karine Florent, A. Subirats, Ben Kaczer, Luca Di Piazza, Sergiu Clima, Nicolo Ronchi, Sean R. C. McMitchell, Kaustuv Banerjee, Umberto Celano, Masamichi Suzuki, Dimitri Linten, Jan Van...
View ArticleClik here to view.
Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion >...
S. Subhechha, Nouredine Rassoul, Attilio Belmonte, Hubert Hody, Harold Dekkers, Michiel J. van Setten, Adrian Vaisman Chasin, Shamin H. Sharifi, S. Sutar, L. Magnarin, Umberto Celano, H. Puliyalil, S....
View ArticleClik here to view.
A comprehensive variability study of doped HfO2 FeFET for memory applications.
Nicolo Ronchi, Lars-Åke Ragnarsson, Umberto Celano, Ben Kaczer, K. Kaczmarek, K. Banerjee, Sean R. C. McMitchell, G. Van den Bosch, Jan Van Houdt: A comprehensive variability study of doped HfO2 FeFET...
View ArticleClik here to view.
How Lithography and Metrology Are Enabling Yield in the Next Generation of...
Mark Neisser, Ndubuisi G. Orji, Harry J. Levinson, Umberto Celano, James Moyne, Supika Mashiro, Dan Wilcox, Slava Libman: How Lithography and Metrology Are Enabling Yield in the Next Generation of...
View Article
